About OGF Treatment

OGF (Out Gas Free) treatment is a surface treatment with low gas emissions.
In the case of general anodizing treatment, oxidized films with porous structure called porous film grow like pillars on a thin and delicate oxidized film called a barrier layer. On the other hand, OGF treatment generates a kind of film with a non-porous surface (barrier-type film).

	OGF treatment	Sulfuric acid anodize
High heat resistance	◎	△
Voltage resistance	✕	○
Corrosion resistance	◎	○
Gas release	◎	△

Differences between general anodizing treatment and our OGF treatment

 

Features

High heat resistance

Cracks are not created even under high temperatures.
Process temperature (Actual value) = 480◦C

High corrosion resistance

OGF treatment realizes extremely high corrosion resistance, compared to sulfuric acid anodize.
This treatment achieves better corrosion resistance than sulfuric and oxalic acid anodize with a film thickness of 20 μm (unsealed).

Low gas release

The non-porous film structure emits extremely low level of gas.
The amount of gas emitted during this process is as low as one-tenth of that emitted by sulfuric and oxalic acid anodize, as well as electrolytic polishing, which is the same level as that of solid aluminum material.

Applicable to pores and complicated shapes.

Applications

High-vacuum equipment components

• Next-generation ALD (Atomic Layer Deposition) equipment components
• Metal CVD (Chemical Vaper Deposition) equipment components
• High-vacuum epitaxial growth VCE (Vacuum Chemical Epitaxy) components

Expected effects

• Reduction in time-to-vacuum
• Reduction in process errors, such as particle and arcing that occur during processes
• Extension of component lifetime

Treatable size

Workpiece size: 1,200 (Width) x 1,000 (Height) x 500 (Depth) mm
※Including suspended and electrode fixture parts. => Details are to be discussed separately.